About OGF Treatment
OGF (Out Gas Free) treatment is a surface treatment with low gas emissions.
In the case of general anodizing treatment, oxidized films with porous structure called porous film grow like pillars on a thin and delicate oxidized film called a barrier layer. On the other hand, OGF treatment generates a kind of film with a non-porous surface (barrier-type film).
||Sulfuric acid anodize
|High heat resistance
Differences between general anodizing treatment and our OGF treatment
A photo for comparing SEM observation results
High heat resistance
Cracks are not created even under high temperatures.
Process temperature (Actual value) = 480◦C
High corrosion resistance
OGF treatment realizes extremely high corrosion resistance, compared to sulfuric acid anodize.
This treatment achieves better corrosion resistance than sulfuric and oxalic acid anodize with a film thickness of 20 μm (unsealed).
Low gas release
The non-porous film structure emits extremely low level of gas.
The amount of gas emitted during this process is as low as one-tenth of that emitted by sulfuric and oxalic acid anodize, as well as electrolytic polishing, which is the same level as that of solid aluminum material.
Applicable to pores and complicated shapes.
High-vacuum equipment components
- Next-generation ALD (Atomic Layer Deposition) equipment components
- Metal CVD (Chemical Vaper Deposition) equipment components
- High-vacuum epitaxial growth VCE (Vacuum Chemical Epitaxy) components
- Reduction in time-to-vacuum
- Reduction in process errors, such as particle and arcing that occur during processes
- Extension of component lifetime
Workpiece size: 1,200 (Width) x 1,000 (Height) x 500 (Depth) mm
※Including suspended and electrode fixture parts. => Details are to be discussed separately.